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SUMMARY:Methods to Measure Flatband Potential
LOCATION:Chemistry A101
TZID:America/Denver
DTSTART:20240918T160000
UID:2026-04-30-15-14-04@natsci.colostate.edu
DTSTAMP:20260430T151404
Description:About the Seminar: \n\nUnderstanding the bandgap diagram of se
 miconductor materials is crucial for predicting their ability to drive che
 mical reactions. A key parameter in constructing this diagram is the flatb
 and potential\, yet the current methods for measuring it show significant 
 variability. This variability becomes particularly problematic as the fiel
 d shifts toward more complex materials\, which are inadequately described 
 by the commonly used Mott-Schottky (MS) analysis. Comparative studies demo
 nstrate that MS analysis often breaks down when applied to these advanced 
 materials\, indicating its limitations as a reliable method. Alternative a
 pproaches\, such as chopped illumination\, provide more precise flatband p
 otential ranges but still display intra-experiment variability\, with a de
 gree of subjectivity in the determination. These findings suggest the need
  for multiple methods in a single experimental setup to ensure more accura
 te results.\n\nRecent work\, such as Wang et al.\\'s study on the potentia
 l of zero charge using the dropping pipette technique for metals\, undersc
 ores the promise of exploring diverse electrochemical techniques. This tal
 k will review existing methods\, highlight their limitations\, and address
  the growing need for additional measurement techniques. 4:00 pm
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